With the greatest market share worldwide, the SUPRA product line enables stable dry strip processing through its proven performance, and was designed with the smallest footprint to provide higher T/P and lower CoO than conventional products.
PSK#39;s dry cleaning equipment, INTEGER, enables high–aspect ratio contact cleaning and patterning in the semiconductor process by adjusting selectivity through a combination of chuck, baffle temperature, and various types of chemistry.
OMNIS, new hard mask strip equipment, offers a solution which selectively removes films by way of its high selectivity for films with high etching resistance as well as underlying films such as oxides and nitrides.