PSK Group R&D center
We pursue R&D with the goal of creating new value in the global field of semiconductor equipment, discovering new engines for growth and securing advanced technologies to prepare for the future. We are actively investing to secure innovative technologies faster enough to lead the market.
With PSK Group's independently developed and original technologies in recent years, we have successfully secured technologies through indepedent and joint development, and we own hundreds of doemstic and internationall intellectual property rights, patent and trademarks.
Operation of R&D center
Technology development in various academic fields such as electrical, electronics, mechanics, physics, chemistry, materials, and optics
Process development in device and parts with cooperation partners
Collaborative development with research institutions such as universities
Active R&D investment every year
Performance of R&D center
Contribution to 10-nm DRAM development and production by replacing existing wet method with dry cleaning
Contribution to mass production of new hard mask strip process for the first time in the world
Evaluating mass production of new equipment by targeting niche markets in etching field
Contribution to dry process technology using plasma and gas replacing existing wet method technology
Development of key parts such as plasma sources for new equipment
Long-term project for developing etchers, a core piece of equipment in semiconductor processes
The Future of R&D center
In order to secure future engines for growth, PSK Group is pursuing continuous efforts in human resource management in R&D. Scheduled to be established in 2021, Pangyo R&D Campus will be the center and groudwork for the future of PSK Group.